At Plasma-Therm, We've been innovating plasma processing technologies since 1974.
We design and build easy-to-use wafer processing platforms for standard and advanced processes used in microelectronics manufacturing and R&D applications. Our platforms are the centerpiece of our application solutions and cover a wide variety of process steps including etch, deposition, material modification, and die singulation. In addition, our platforms are configurable to help you get the equipment and features you need.
Since the very beginning, we've focused on developing plasma-based technologies and equipment processing tools that deliver excellent value. That is our calling card. We grew organically through acquisitions and strategic partnerships so we could offer broader solutions. Today, we are a solid, reliable, and trusted partner. From 300mm on down the line, you get proven system solutions at a competitive price/value equation, with process knowledge and service attention that will exceed your expectations.
HEATPULSE™ RTP SYSTEM(AG)
OUR HEATPULSE RTP IS A NEWLY RELEASED RAPID THERMAL PROCESSING (RTP) SYSTEM CAPABLE OF PROCESSING DIVERSE MATERIALS IN A VARIETY OF SUBSTRATE SIZES
Rapid thermal processing (RTP) can be used in a multitude of semiconductor process steps, such as post-implant annealing, growth of oxide and nitride films, reflow, and formation of silicides, salicides, and metal alloys. In a single-wafer chamber, wafers are rapidly heated and held at a closed-loop controlled temperature. The Heatpulse RTP system can process a variety of substrates, such as silicon, silicon carbide (SiC), gallium arsenide (GaAs), gallium nitride (GaN), quartz, and sapphire.
AG Heatpulse Legacy Systems
We support the legacy AG Heatpulse 8108 and 8800 systems with spare parts, field service, and upgrades.
TEGAL™ ETCH SYSTEMS
TEGAL ETCH SYSTEMS ARE INDUSTRY PROVEN CASSETTE-TO-CASSETTE PLATFORMS FOR VOLUME MANUFACTURING
Plasma-Therm's® Tegal 900 Series parallel-plate reactive ion etching (RIE) systems are industry standards for descum and noncritical dielectric etching. These systems, built for efficiency, reliability, and a small footprint, are available in both manual and cassette loading configurations.
Tegal Legacy Systems
We support spare parts and upgrades for a wide range of Tegal legacy products including 901e, 903e, 901g, and 6500 HRe cluster tools.
ECLIPSE™ PVD SYSTEM(MRC)
CURRENTLY, PLASMA-THERM® IS THE AUTHORIZED MANUFACTURER FOR REFURBISHED MRC ECLIPSE MARK II AND IV PVD SYSTEMS, ALONG WITH FACTORY-APPROVED UPGRADES AND SPARE PARTS SUPPORT
The Eclipse Mark IV physical vapor deposition (PVD) system is an upgrade from the Mark II, offering a larger process portfolio and occupying a smaller footprint. The Mark IV is used for depositing metal for interconnects, via fill, silicides, packaging (C4, die attach), and other processes. The wafer transport is suitable for gallium arsenide, other compound semiconductor wafers, and thinned silicon wafers. Sputtering occurs in vacuum-isolated chambers, limiting contamination. The system features the upgraded Epoch controller with enhanced throughput and factory automation support.