MIDAS SYSTEM CO., Ltd. develops and produces Mask Aligner and Spin Coater equipment required by laboratories and companies related semi-conductor, MEMS, Bio element and Nano Technologies. As for the mask aligner for wafer, we led the first development and commercialization in Korea, and continued to make up for the technologies in order to strengthen the basis as a technology centered company. Also the mask aligner for wafer is applicable for various fields and at present utilized in board fields such as the research and production of semi conductor, the research on the MEMS process and the production from MEMS applications, researched on bio chips and Nano technologies. We always appreciate for your attention and supports.
Spin Coater
4 ~ 6inch
6 ~ 8inch
Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation
- Substrate Size: piece ~ up to 4 inch
- Spin Speed: 300 ~ 7,000 rpm(@without load) an error of less than 3 % (overseas 10,000 rpm)
- Spin Recipe: 50 steps, 50 recipes
- Chuck Material: Anodized AL, Acetal
- Bowl Size: 8 inch
- Bowl Material: Polypropylene
Button type control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation Glove box
- Substrate Size: piece ~ up to 4 inch
- Spin Speed: 300 ~ 7,000 rpm(@without load) an error of less than 3 %
- Spin Recipe: 50 steps, 50 recipes
- Chuck Material: Anodized AL, Acetal
- Bowl Size: 8 inch
- Bowl Material: Polypropylene
Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl
- Substrate Size: piece ~ up to 6 inch
- Spin Speed: 300 ~ 7,000 rpm(@without load) an error of less than 3 %
- Spin Recipe: 50 steps, 50recipes
- Chuck Material: Anodized AL, Acetal
- Bowl Size: 12 inch
- Bowl Material: Stainless Steel
Touch panel control , Compact unit for various coating solutions , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl
- Substrate Size: piece ~ up to 8 inch
- Spin Speed: 300 ~ 7,000 rpm(@without load) an error of less than 3 %
- Spin Recipe: 50 steps, 50 recipes
- Chuck Material: Anodized AL, Acetal
- Bowl Size: 12 inch
- Bowl Material: Stainless Steel
12inch~
Touch panel control , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl , Dispenser
- Substrate Size: 8 ~ 12 inch
- Spin Speed: 300 ~ 5,000 rpm(@without load) an error of less than 3 %
- Spin Recipe: 20 steps, 20 recipes
- Chuck Material: Anodized AL, Acetal
- Bowl Size: 18 inch
- Bowl Material Stainless Steel
- Dispenser: Option
Customized products , Programmable Recipe management , Easy operation , Adopt Drain , Exhaust hole in bowl
- SPEC: Customized
Mask Aligner
4 ~ 6inch
Easy operation & Installation , Handling Substrates of Various sizes , Adopt UV-LED exposure module , UV-LED Life-time is long
- Type: Fully manual
- Mask Size: up to 5 inch
- Substrate Size: piece to 4 inch circle
Easy operation & Installation , Handling Substrates of Various sizes , PLC control with Touch screen panel
- Type: Fully manual
- Mask Size: up to 5 inch
- Substrate Size: piece to 4 inch circle
Easy operation & Installation , Handling Substrates of Various sizes , PLC Operation with PC control
- Type: Fully manual
- Mask Size: up to 7 inch
- Substrate Size: piece to 6 inch circle
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Microscope position control system , Auto Align mark searching function
- Type: Fully automatic
- Mask Size: up to 5 inch
- Substrate Size: 2~4 inch
6 ~ 8inch
Easy operation & Installation , Handling Substrates of Various sizes , Adopt UV-LED exposure module , UV-LED Life-time is long
- Type: Fully manual
- Mask Size: up to 7 inch
- Substrate Size: piece to 6 inch circle
Easy operation & Installation , PLC Operation with PC control , Compact size semi auto system , Image grab & Data log , More than 100 Program recipes
- Type: PC control semi auto
- Mask Size: up to 7 inch
- Substrate Size: piece to 6 inch circle
Easy operation & Installation , PLC Operation with PC control , Compact size semi auto system , Image grab & Data log , More than 100 Program recipes
- Type: PC control semi auto
- Mask Size: up to 9 inch
- Substrate Size: piece to 8 inch circle
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Motorized joystick contro l, Motorized zoom microscope and stage
- Type: PC control semi auto
- Mask Size: up to 9 inch
- Substrate Size: 6~8 inch
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Microscope position control system , Auto Align mark searching function
- Type: Fully automatic
- Mask Size: up to 7 inch
- Substrate Size: 4~6 inch
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Microscope position control system , Auto Align mark searching function
- Type: Fully automatic
- Mask Size: up to 9 inch
- Substrate Size: 6~8 inch
12inch~
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Motorized joystick control , Motorized zoom microscope and stage , Microscope position control system
- Type: Joystick control Semi-Auto
- Mask Size: up to 14 inch
- Substrate Size: 8~12 inch
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Motorized joystick control , Motorized zoom microscope and stage , Microscope position control system
- Type: Joystick control Semi-Auto
- Mask Size: User spec.
- Substrate Size: User spec. (Large area)
PLC Operation with PC control , Image grab & Data log , More than 100 Program recipes , Microscope position control system , Auto Align mark searching function
- Type: Fully automatic
- Mask Size: up to 14 inch
- Substrate Size: 8~12 inch
PLC Operation with PC control Image grab & Data log More than 100 Program recipes Microscope position control system Auto Align mark searching function
- Type: Fully automatic
- Mask Size: User spec.
- Substrate Size: User spec.
Easy operation & Installation, Handling Substrates of Various sizes, Scan & Step type exposure
- Type: Scan & Step Exposure
- Mask Size: User spec.
- Substrate Size: User spec.
Nano/Micro Imprint
Nano/Micro imprint is equipment that can manufacture a pattern of nm/um size. It is equipment capable of producing an low cost, high-efficiency, high-resolution pattern in which the surface pattern of stamps is replicated on the resist.
Nano Imprint Kit
EZImprinting's equipment consists of a nanoimprint module and a controller module. By simply retrofitting your conventional optical mask aligner, our solution can upgrade any facility's traditional photolithography capacity.
EZImprinting provides semiautomatic nanoimprinting with precision nanoscale alignment capabilities. Simple, straight-forward steps direct users through the entire imprint procedure.
- Substrate Size: 4 inch
- Imprintable Wafer Area: 4 inch Maximum
- Mold Substrate Size: 5 x 0.09 inch
- Typical Imprint throughput: < 5 min./wafer
- Imprint Pressure: 0 - 25 PSI
Maskless System
The Beam MK is a versatile UV laser writer with ultra-high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.
- Substrate Size: Min. 5 x 5 mm, max. 100 x 100 mm
- Substrate Thickness: 0 – 1 ~8 mm
- Light Source: 365 nm, UV LED
- Process Type: DMD
- Process Resolution: Min. 800 nm
- Alignment Accuracy: < 1 μm
- The PicoMaster Start 100 is a versatile UV laser writer with ultra-high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.
- Substrate Size: Min. 5 x 5 mm, max. 125 x 125 mm
- Substrate Thickness: 0- 4 mm manual adjustment. 12 mm with the optional motorized Z-axis installed.
- Laser wavelength: 405 nm, GaN laser diode.
- Laser intensity: Max. 3 mW in the spot. Software controllable.
- Process Resolution: Min. 600 nm
- Alignment Accuracy: < 0.5 μm
The PicoMaster 100 is a versatile UV laser writer with ultra-high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.
- Substrate Size: Min. 5 x 5 mm, max. 125 x 125 mm
- Substrate Thickness: 0- 4 mm manual adjustment. 12 mm with the optional motorized Z-axis installed.
- Laser wavelength: 405 nm, GaN laser diode.
- Laser intensity: Max. 3 mW in the spot. Software controllable.
- Process Resolution: Min. 300 nm
- Alignment Accuracy: < 0.5 μm
Maskless System is equipment that implements a pattern designed by the user using a laser without a photomask in a photo-lithography process.
- Substrate Size: Min. 5 x 5 mm, max. 160 x 160 mm
- Substrate Thickness: 0- 4 mm manual adjustment. 12 mm with the optional motorized Z-axis installed.
- Laser Wavelength: 405 nm, GaN laser diode.
- Laser Intensity: Max. 3 mW in the spot. Software controllable.
- Process Resolution: Min. 300 nm
- Alignment Accuracy: < 0.5 μm
The PicoMaster 200 is a versatile UV laser writer with ultra-high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers.
- Substrate Size: Min. 5 x 5 mm, max. 220 x 220 mm
- Substrate Thickness: 0 - 4 mm manual adjustment. 12 mm with the optional motorized Z-axis installed.
- Laser Wavelength: 405 nm, GaN laser diode.
- Laser Intensity: Max. 3 mW in the spot. Software controllable.
- Process Resolution: Min. 300 nm
- Alignment Accuracy: < 0.5 μm
- Write speed: up to 250 mm² / min
- Resolution: 0.6um